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| Partname: | C7460 |
| Description: | Simultaneous measurement from 200-950nm; multiband plasma-process monitor |
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| Package: | -- |
| Oper. temp.: | 0 to 40 |
| Datasheet: | PDF (524K).
Click here to download *) |
The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-time. |
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Click here to download C7460 Datasheet*) |
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