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Partname:C7460
Description:Simultaneous measurement from 200-950nm; multiband plasma-process monitor
Manufacturer:
Package:--
Oper. temp.:0 to 40
Datasheet:PDF (524K).
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The Multiband Plasma-Process Monitor (MPM) is a system specifically designed for monitoring the optical plasma emissions that are created during the various manufacturing processes of semiconductors including etching, sputtering, cleaning, and CVD. The MPM can handle multi-channel recording in real-time.

Click here to download C7460 Datasheet
Click here to download C7460 Datasheet
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